Alfa Chemistry provides a wide range of nanoimprint lithography (NIL) resists for thermal nanoimprint (T-NIL) and UV nanoimprint lithography (UV-NIL) processes, as well as technical advice and services.

mr-NIL210 is a purely organic, photo-curable NIL resist with oustanding dry etch characteristics. It features an excellent curing and nanoimprint performance and is particularly suitable for soft-NIL using soft stamp materials, e.g. PDMS.

micro resist technology develops different solvent-free UV-curable materials which can be dispensed via inkjet approach at room temperature or at slightly increased temperatures. The main purpose of those UV-NIL resists is to provide a) high dry etching stability for pattern transfer approaches or b) high refractive index for optical applications.

Nanoimprint lithography (NIL) is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes.

mr-NIL200 is a photo-curable NIL resist specifically for applying hard and non-permeable stamp materials. The typical application field of mr-NIL200 is the use as an etch mask in pattern transfer processes for e.g. photonic applications. mr-NIL200 works without the need for any additional adhesion promoter or primer.

The mr-NIL200 series are photo-curable NIL resist formulations specifically developed for UV nanoimprint lithography (UV-NIL) applying gas-impermeable stamp materials. The typical application field of mr-NIL200 is the use as an etch mask in pattern transfer processes for e.g. photonic applications via reactive ion etching approaches.

micro resist technology GmbH Gesellschaft für chemische Materialien spezieller Photoresistsysteme mbH Köpenicker Str. 325 12555 Berlin GERMANY Ready-to-use Formulations for Thermal & Photo (UV) Nanoimprint Lithography (NIL) • Coating of various substrates with excellent fi lm quality (Si, SiO 2, glass, Al, Al 2 O 3, plastics)

PR-NIL200 is a photo-curable NIL resist formulations specifically developed for UV nanoimprint lithography (UV-NIL) applying gas-impermeable stamp materials. The typical application field is the use as an etch mask in pattern transfer processes for e.g. photonic applications via reactive ion etching approaches.

RotaLab provides resist formulations for nanoimprint lithography (NIL). The unique key features of our products are outstanding film forming and imprinting performance beside excellent pattern fidelity and plasma etch stability.

2010年2月1日 · Unlike traditionally optical lithographic approaches, which create pattern through the use of photons or electrons to modify the chemical and physical properties of the resist, NIL relies on direct mechanical deformation of the resist and can therefore achieve resolutions beyond the limitations set by light diffraction or beam scattering that ...