Optical proximity correction (OPC) is a photolithography enhancement technique commonly used to compensate for image errors due to diffraction or process effects. The need for OPC is seen …

OPC 是对光掩膜图形的预补偿以使硅片图像尽可能地满足设计规格的要求。OPC 主要有三种基本的修正方法：线宽变化最小、减小线端缩短和方角修正。 1. 使线宽变化最小的直接例子之一 …

光学邻近校正(opc)是一种光刻增强技术，影响造成的图像错误。 OPC主要在半导体器件的生产过程中使用，目的是为了保证生产过程中设计的图形的边缘得到完整的 刻蚀 。

2019年9月4日 · In this article, we develop a generative adversarial network (GAN) model to achieve better mask optimization performance. We first develop an OPC-oriented GAN flow …

A resolution enhancement technique (RET), OPC makes use of tiny sub-resolution assist features (SRAFs), or decoration-like shapes, on the photomask. OPC modifies the mask patterns to …

In this article, we pioneer introducing the reinforcement learning (RL) model for mask optimization, which directly optimizes the preferred objective without lever-aging a differentiable proxy. …

当k1比较大的时候，mask和wafer比较接近，不需要 RET (resolution enhancement technology) 或者 OPC (optical proximity correction) 。 随着k1逐渐减小， 光学邻近效应 逐渐增强，mask …

2024年11月7日 · In this paper, we propose CAMO, a reinforcement learning-based OPC system that specifically integrates important principles of the OPC problem. CAMO explicitly involves …

In this article, we pioneer introducing the reinforcement learning (RL) model for mask optimization, which directly optimizes the preferred objective without leveraging a differentiable proxy. …

Optical proximity correction (OPC) is one of the most widely used RETs aiming at compensating the mask to generate a more precise wafer image. In this article, we put forward a level-set …