计算光刻课题组--课题组简介 - CAS
2018年11月8日 · 主要研究内容包括：基于物理模型的光学邻近效应修正技术（OPC）、亚分辨率辅助图形技术（SRAF）、光源-掩模协同优化技术（SMO）、反向光刻技术（ILT）等分辨率 …
RuleLearner: OPC Rule Extraction From Inverse Lithography …
2024年11月15日 · This paper proposes RuleLearner, a comprehensive mask optimization system designed for SRAF generation and model-based OPC in real industrial scenarios. The …
Automatic SRAF size optimization during OPC - ResearchGate
2009年3月1日 · Sub-resolution assist features (SRAFs) are a common addition to low-k1 masks to improve process window for isolated features. Traditional SRAF placement,...
How to apply machine learning technology in OPC for smart SRAF generation and placement to balance the performance and runtime? Newron SRAF method utilizes supervised machine …
芯片资料三：基于机器学习的SRAF提高在1X节点及以下的OPC性 …
CTM（Continuous Transmission Mask）技术是一种新的迭代生成参考图的方法，可以提取和放置比传统SRAF引导图（SGM）精度更高的SRAF。 然而，迭代计算会运行时间会很长，使 …
Dual Metric OPC for Complex SRAF Implementation
2008年1月22日 · In this paper, we are proposing a novel approach for the optimum placement of SRAF structures using state of the art Calibre RET flow. In this approach, the optimal SRAF …
Traditional studies about SRAF is always around target main pattern and SRAF, but OPC can change the shape of target pattern, so this paper is investigated the relationship between …
Driven by steadily decreasing critical dimensions in the semiconductor technology, sub-resolution assisting feature (SRAF) has been proposed to enlarge the capability of the exposure …
OPC建模中次分辨率辅助图形确定的方法与流程 - X技术网
次分辨率辅助图形 (sub-resolutionassistantfeature,sraf)是被放置在稀疏设计图形周围的细小图形，使稀疏图形在光学的角度上看像密集图形，有助于改善稀疏图形在焦深工艺窗口边缘的图像 …
Sub-resolution assist feature (SRAF) study for active area …
Sub-resolution assistant feature (SRAF) is applied to enhance the process window of isolated and semi-isolated features by taking advantage of the optical interference between the main …