Pulsed laser deposition (PLD) is a physical vapor deposition (PVD) technique where a high-power pulsed laser beam is focused inside a vacuum chamber to strike a target of the material that is to be deposited.

脉冲激光沉积（Pulsed Laser Deposition，PLD）制膜技术是利用高能激光束作为热源来轰击待蒸发材料，然后在基片上蒸镀薄膜的一种新技术。 激光光源可以采用准分子激光、CO2激光、Ar激光、钕玻璃激光、红宝石激光及…

脉冲激光沉积（Pulsed Laser Deposition，PLD），也被称为脉冲激光烧蚀（pulsed laser ablation，PLA），是一种利用激光对物体进行轰击，然后将轰击出来的物质沉淀在不同的衬底上，得到沉淀或者薄膜的一种手段。

在 PLD 中，将一块固体薄材料（称为靶材）放置在真空室内，靠近要沉积薄膜的基板。然后，根据材料的特性，可以选择工作波长为 193 nm、248 nm 或 308 nm 的高能紫外线准分子脉冲来照射靶材。准分子激光脉冲的高通量可产生具有高度电离和高动能的原子种类 ...

PLD作为一种真空物理沉积方法，当一束强的脉冲激光照射到靶材上时，靶表面材料就会被激光所加热，熔化，气化直至变成等离子体（通常在气氛气体中）从靶向衬底传输，最后输运到衬底上的烧蚀物在衬底上凝聚，成核至形成薄膜。 激光与靶材的相互作用. 该过程重要参数参考文档：激光与靶材相互作用（转移至其他作品） 链接： 低能量密度的准分子激光已经被用来沉积半导体和高温超导薄膜。 脉冲激光蒸发过程可以被分为三个独立的阶段： 1.激光束和靶材相互作用导致 …

Recently, pulsed laser deposition (PLD) has appeared to be an impactful method for wafer-scale growth of 2D films, owing to target-maintained stoichiometry, high growth rate, and efficiency. In this review, the recent advances on the PLD preparation of 2D films are summarized, including the growth mechanisms, strategies, and materials ...

2023年1月25日 · The PLD method produces superior RF thin films at even lower costs than the legacy sputter deposition process. It creates highly ordered thin films with homogeneous RF characteristics ready for the 5G and 6G era.

Pulsed laser deposition (PLD) is a simple and extremely versatile technique to grow thin films and nanomaterials of a wide variety of materials. PLD allows the deposition of profoundly different materials, including high-temperature superconductors, oxides, nitrides, carbides, semiconductors, metals, and even polymers or fullerenes with high ...

2020年11月9日 · Currently, pulsed laser deposition (PLD) is a widely used technique to grow thin films for academic research and for industrial applications. The PLD has superior advantages including versatility, control over the growth rate, stoichiometric transfer and unlimited degree of freedom in the ablation geometry compared to other deposition techniques.

2003年1月1日 · Pulsed laser deposition (PLD) is for many reasons a versatile technique. Since with this method the energy source is located outside the chamber, the use of ultrahigh vacuum (UHV) as well as ambient gas is possible. Combined with a stoichiometry transfer between...