2021年1月1日 · 我们用 XRD对p-Si(110 衬底上蒸发沉积的不同厚度的 PTCDA 薄膜进行了性能表征。 XRD测试结果表明. PTCDA 在p- Si (110)面上均以晶体方式生长。 随蒸发时间变化，即随着 PTCDA 薄膜的厚度增加，在生. 长的薄膜中出现了 α 型和 β 型两种并存的 PTCDA 。 不同衬底温度下生长的 PTCDA 薄膜的生长方式为 α、 β...

2022年4月19日 · Herein, perylenetetracarboxylic acid nanosheets with a monolayer thickness of ~1.5 nm were synthesized and shown to be active hydrogen evolution photocatalysts with production rates of 118.9 mmol g...

2021年8月1日 · Synthesized colorants are characterized using Fourier transform infrared spectroscopy (FTIR), proton nuclear magnetic resonance (1 H NMR), and X-ray diffraction (XRD) techniques to analyze the structure of the fluorescent pigments. Field emission scanning electron microscopy (FE-SEM) is used to present the morphology of fluorescent pigments and ...

2022年11月1日 · The XRD patterns prove that PTCDA-Co(II) MOFs showed higher crystallinity than PTCDA-La(III) MOFs with 27.1 and 4 % crystallinity values, respectively. On the other hand, the fluorescence spectroscopy measurements revealed that the PTCDA–La(III) MOF possessed slightly higher fluorescence character than PTCDA-Co(II) MOFs with 13,000 vs 10,500 ...

2018年6月20日 · The structural characteristics of the CB/PTCDA composites were first surveyed with X-ray diffraction (XRD). As shown in Fig. 2 a, pure PTCDA manifests a typical β-crystalline form in the monoclinic P2 1 /c space group [24] which exhibits four intensive diffraction peaks locating at around 9.4°, 12.3°, 24.6°, 27.5°, respectively ...

采用真空升华法纯化了国产的3,4,9,10 per四羧酸二酐（PTCDA）粉，在450℃的升华温度下纯度为98％。 经比尔定律和紫外可见分光光度计测试分析，其纯度达到99.8％。

2006年4月6日 · The effect of deposition temperature on the photophysical properties of 3,4,9,10-perylenetetracarboxylic dianhydride (PTCDA) and N,N'-dimethylperylene-3,4,9,10-bis(dicarboximide) (Me-PTCDI) films is investigated with steady-state and …

Abstract: Thin films of 3,4,9,10-perylenetetracarboxylic dianhydride (PTCDA) of different thicknesses (155, 230, 354, and 470 nm) are prepared using thermal evaporation method. The XRD pattern confirms that the this films are preferentially grown along (102) direction.

Abstract: We used X-ray diffraction(XRD) analyze the property of each PTCDA film which deposited on p-Si(110) substrate in different technological parameter. the result of XRD analysis showed PTCDA thin film which deposited on p-Si(110) substrate growth pattern is crystal. With the increase of the thickness of PTCDA film, there appears α-PTCDA ...

2020年1月1日 · The XRD spectra of Co 3 O 4 /PTCDA/g-C 3 N 4 composites show the characteristic peaks of both PTCDA and g-C 3 N 4, confirming the chemical components of Co 3 O 4 /PTCDA/g-C 3 N 4 photocatalysts.