ALD is a vapor phase thin film deposition technique that has gained considerable popularity in recent years. The following list of ALD benefits goes a long way towards explaining the broad …

Atomic layer deposition (ALD) is a thin-film deposition technique based on the sequential use of a gas-phase chemical process; it is a subclass of chemical vapour deposition. The majority of …

2011年8月1日 · Plasma enhanced ALD (PE-ALD) allows deposition at significantly lower temperatures with better film properties compared to that of conventional thermal ALD. In …

等离子体增强原子层沉积 (peald) 是一种先进的薄膜沉积技术，它结合了原子层沉积 (ald) 和等离子体增强化学气相沉积 (pecvd) 的原理。 它利用原子层沉积（ALD）的连续自限制反应，实现原 …

2014年3月5日 · Atomic layer deposition (ALD) is a key technology enabler of nanoscale memory and logic devices owing to its excellent conformality and thickness controllability. Plasma …

原子层沉积（Atomic Layer Deposition，ALD）是一种先进的沉积技术，允许以精确控制的方式沉积数纳米厚度的薄膜。 ALD不仅提供了出色的厚度控制和均匀性，还能够对高长宽比结构进 …

A plasma-enhanced atomic layer deposition (PE-ALD) system enables the conformal fabrication of thin films of various materials with atomic-scale control. ALD is a controlled chemical vapor …

2020年5月18日 · Atomic layer deposition (ALD) is a material growth process that is based on a pair of sequential, self-limiting, surface-mediated reactions that lead to a nominal layer-by …

2019年3月18日 · In the past few years, plasma ALD has obtained a prominent position in the field of ALD with (i) a strong application base as demonstrated by the breakthrough in high-volume …

2024年12月9日 · Plasma-assisted plasma assisted atomic layer deposition (PEALD) takes this technology a step further, enhancing deposition processes with the unique properties of …