2022年3月1日 · X-ray photoelectron spectroscopy (XPS, Omicron Nano-Technology GmbH, Al-anode, 240W) is used to find the chemical composition of one Si sample coated via iCVD with the PFBSF-initiated PV3D3. The film thickness was 25 nm.

2015年3月9日 · Here, we demonstrate poly (1,3,5-trimethyl-1,3,5-trivinyl cyclotrisiloxane) (pV3D3) prepared via a one-step, solvent-free technique called initiated chemical vapour deposition (iCVD) as a...

2020年9月6日 · A new strategy for multilayer stacking using charge trapping layer (CTL) is proposed and a new CTL material is synthesized, which contains a trilayer dielectric with the total thickness less than 28 nm, deposited by initiated chemical vapor deposition (iCVD) process. 2.6 nm thick poly(1,3,5-trimethyl-1,3,5-trivinyl cyclotrisiloxane) (pV3D3) and ...

2023年2月2日 · The compositions of the deposited copolymer films were analysed using X-ray photoelectron spectroscopy (XPS). The intensity of the Si2 p peak gradually increases as the V3D3 flow rate increases...

2022年10月1日 · Characterization of thin films: To obtain FT-IR spectra of pCHA, pCV1, pCV2, and pV3D3, ALPHA FT-IR spectrometer (Bruker Optics, USA) was used in absorbance mode. XPS (K-Alpha, ThermoFisher Scientific) measurement was performed to obtain high resolution Si2p spectra and the atomic percentage of the polymer films.

利用引发化学气相沉积，沉积 pV3D3 聚合物薄膜，具有无溶剂、室温沉积和无针孔薄膜等优点。 该研究调查了多芯片堆叠在低温环境下聚合物对聚合物热压接合（TCB）的可行性。

Here, we show that poly(1,3,5-trimethyl-1,3,5-trivinyl cyclotrisiloxane) (pV3D3) prepared via a one-step, solvent-free technique called initiated chemical vapour deposition (iCVD) is a versatile...

High purity pV3D3 thin films were deposited using the iCVD process, followed by FTIR, XPS, and AFM analyses after various surface treatment processes. Additionally, TCB results were presented through SAT and SEM analyses, and a bonding mechanism was proposed, focusing on the chemical structure changes during TCB.

2020年7月1日 · (b) X-ray photoelectron spectroscopy (XPS) C 1s high resolution scan shows CF 2 enrichment with decreasing V3D3 concentration, while the fluoromonomer concentration is increased. (c) XPS high resolution scan shows a decrease of the Si 2p peak intensity with decreasing V3D3 and increasing fluoromonomer concentration.

2021年10月23日 · 该团队通过引发式化学气相沉积(icvd)制备了聚(1,3,5-三甲基-1,3,5-三乙烯基环三硅氧烷)(pv3d3)交联网络薄膜，接着通过vpi将氧化锌有效负载于pv3d3薄膜中 ...