SiO 2 occurs in interlayer insulating films and STI. When SiO 2 films are polished, a silica-based slurry is mainly used, and KOH (potassium hydroxide) and NH 4 OH (ammonium hydroxide) …

2018年7月12日 · Amorphous SiO 2 (a-SiO 2) thin films are widely used in integrated circuits (ICs) due to their excellent thermal stability and insulation properties. In this paper, the thermal …

Silicon dioxide (SiO 2) and more generally ultra-thin oxide films have been extensively described as good components for modern nanotechnologies such as dielectric materials in silicon …

Film stress and refractive index play an important role in the fabrication of suspended waveguides. SiO2 waveguides were successfully fabricated on multiple substrates including …

2024年5月30日 · SiO 2 films and their formation technologies are critical for the fabrication of Si-based integrated circuits (ICs). SiO 2 films fabricated using plasma-enhanced chemical vapor …

Silicon dioxide thin films are an amorphous form of silica consisting of SiO 4 tetrahedra linked together through all four oxygen atoms. The term amorphous means that the films do not have …

2018年2月12日 · The optical and mechanical properties of amorphous SiO2 films deposited on soda-lime silicate float glass by reactive RF magnetron sputtering at room temperature were …

In this study, silicon oxide (SiO2) films were deposited by remote plasma atomic layer deposition with Bis(diethylamino)silane (BDEAS) and an oxygen/argon mixture as the precursors. …

2000年4月1日 · In this study we review our recent results on ultra thin SiO 2 films for film thickness measurements, the kinetics of the initial regime of Si oxidation, and interfacial …

2016年2月22日 · We systematically investigated growth characteristics, chemical compositions, and electrical properties of PE-CVD SiO 2 prepared under various deposition conditions. The …