2024年9月13日 · This week, it turned out that Shanghai Microelectronics Equipment (SMEE) had applied for a patent covering an EUV lithography machine, reports the South China Morning Post. The patent, which...

2024年9月11日 · 极紫外光刻技术（EUV lithography）是一种使用波长为13.5纳米的极紫外光作为光源的下一代光刻技术，广泛应用于半导体制造中，是面向7nm及以下节点的主流光刻技术。

2024年9月18日 · 最近中国上海微电子设备（集团）股份有限公司 (SMEE)，公布了一系列制造7nm及以下芯片关键能力的专利，或许可以突破欧美的科技围堵。 中国国家智慧财产局于9月10日披露了一项名为“极紫外线辐射发生装置及光刻设备”的发明专利，内容涉及极紫外线辐射（EUV）发生装置及光刻设备，申请者为上海微电子装备（集团）股份有限公司。 上海微电子此次揭露的专利主要涉及EUV光源及光刻设备，其中重点的极紫外线辐射发生器（光源）主要包括 …

2024年9月22日 · 国产光刻机领域再迎重大突破，上海微电子装备集团（smee）悄然申请了一项关于极紫外（euv）光刻机的专利。 这项专利不仅瞄准了EUV光刻机制造的第二大难点——光源收集，更被业内人士认为在某些方面超越了行业巨头ASML的技术。

2024年9月12日 · A newly revealed patent from Chinese lithography systems maker Shanghai Micro Electronics Equipment (SMEE) shows how domestic firms could progress in the local advanced lithography tools market...

2025年3月12日 · Rumors are spreading about China’s efforts to create its own Extreme Ultraviolet (EUV) lithography machines, which could potentially bypass restrictions on advanced semiconductor equipment. According to recent search results, China may begin trials of domestically developed EUV machines in the third quarter of this year.

2024年9月13日 · SMEE (Shanghai Micro Electronics Equipment) filed a new EUV patent. It is entitled “extreme ultraviolet [EUV] radiation generators and lithography equipment”. The patent was issued in March 2023 and is now being examined by the Chinese Intellectual Property Administration. However, it may soon receive approval.

Shanghai Micro Electronics Equipment (SMEE) has filed a patent for EUV radiation generators and lithography equipment, pushing forward China's lithography advancements and challenging ASML's dominance despite ongoing US sanctions. The dedicated team at Semiconductor Packaging News has provided this summary for your convenience.

2024年4月1日 · By using SAQP with deep ultraviolet lithography (DUV) machines from Dutch giant ASML and Japanese suppliers like Nikon, China could make sophisticated 5-nanometre grade chips without the need for...

2024年9月13日 · The “extreme ultraviole­t [EUV] radiation generators and lithograph­y equipment” patent, filed in March 2023, was published on Tuesday and is still being vetted by the China National Intellectu­al Property Administra­tion, according to a …