RuleLearner: OPC Rule Extraction From Inverse Lithography …
2024年11月15日 · Model-based Optical Proximity Correction (OPC) with Sub-Resolution Assist Feature (SRAF) generation is a critical standard practice for compensating lithography …
Automatic SRAF size optimization during OPC - ResearchGate
2009年3月1日 · Sub-resolution assist features (SRAFs) are a common addition to low-k1 masks to improve process window for isolated features. Traditional SRAF placement, which...
芯片资料三：基于机器学习的SRAF提高在1X节点及以下的OPC性 …
CTM（Continuous Transmission Mask）技术是一种新的迭代生成参考图的方法，可以提取和放置比传统SRAF引导图（SGM）精度更高的SRAF。 然而，迭代计算会运行时间会很长，使 …
Driven by steadily decreasing critical dimensions in the semiconductor technology, sub-resolution assisting feature (SRAF) has been proposed to enlarge the capability of the exposure …
OPC建模中次分辨率辅助图形确定的方法与流程 - X技术网
次分辨率辅助图形 (sub-resolutionassistantfeature,sraf)是被放置在稀疏设计图形周围的细小图形，使稀疏图形在光学的角度上看像密集图形，有助于改善稀疏图形在焦深工艺窗口边缘的图像 …
How to apply machine learning technology in OPC for smart SRAF generation and placement to balance the performance and runtime? Newron SRAF method utilizes supervised machine …
Traditional studies about SRAF is always around target main pattern and SRAF, but OPC can change the shape of target pattern, so this paper is investigated the relationship between …
Sub-resolution assist features (SRAFs) are a common addition to low-k1 masks to improve process window for isolated features. Traditional SRAF placement,...
Dual Metric OPC for Complex SRAF Implementation
2008年1月22日 · In this paper, we are proposing a novel approach for the optimum placement of SRAF structures using state of the art Calibre RET flow. In this approach, the optimal SRAF …
带SRAF的OPC修正方法与流程 - X技术网
2023年2月3日 · 1.本发明涉及半导体光刻技术领域，特别是涉及一种带sraf的opc修正方法。 2.随着超大规模集成电路 (ulsi，ultra large scale integration)的飞速发展，集成电路制造工艺变得越 …