The Vistec VSB systems combine state of the art fully automated substrate handling, adjustment and alignment with a high-precision stage system and a sophisticated electron-optical 50 keV column specifically developed to ensure excellent lithography performance.

3 天之前 · Based on the Variable Shaped Beam (VSB) principle, the electron-beam lithography systems are mainly utilized for industrial and advanced research applications, such as electron-beam direct write in semiconductor manufacturing, including compound semiconductor, direct write mask making as well as photonics and several new emerging markets.

Vistec的曝光系統是以可變形狀光束（VSB）原理為主，其中使用強度均勻分佈的可變形狀和尺寸的電子束在基材上曝光於光阻圖案（也稱爲曝光或寫入）。

Vistec SB254是一款全自动化、高性能、成本效益高的电子束光刻系统，专门设计用在工业和先进的研究。 它以可变形光束 (VSB)原理为基础，200mm的平台工具广泛用在现阶段与新兴半导体和纳米技术的应用上，包括硅片的直接写入、化合物半导体、掩膜制造、整合 ...

Vistec的光刻系统是以可变形状光束（VSB）原理为主，其中使用强度均匀分布的可变形状和尺寸的电子束在基材上光刻於含光阻图案（也称为曝光或写入）。

Vistec Electron Beam is a leader in the design and manufacturing of electron-beam lithography systems, which are based on the Variable Shaped Beam (VSB) principle.

The Vistec SB3050 Series - now with a Cell Projection option - is our commitment to semiconductor manufacturing professionals. Designed to meet the challenges of direct patterning down to the 32nm technology node, it features Variable Shape Beam (VSB) technology with vector scan and continuously moving stage principles for throughput optimization.

Based on the Variable Shaped Beam (VSB) principle, the electron-beam lithography systems are mainly utilized for semiconductor applications and advanced research as silicon direct write, compound...

Vistec’s SB254 is a fully automated, high performance, cost-effective electron-beam lithography system designed for use in both industry and advanced research.

2024年12月5日 · 为了满足光学质量和吞吐量的预期，Vistec的可变形状束（VSB：Variable Shaped Beam）技术[Efficient exposure of non-Manhattan layouts for optical applications using variable shaped beam lithography]采用了可以同时提高光学性能和吞吐量的解决方案和参数。