AX7695 integrates a quartz vacuum chamber, RF power supply and all necessary controls into a compact, self-contained unit for easy installation directly on the tool process chamber for an extremely clean, low cost source of atomic radicals to bring about the desired reaction on the wafer, at a reduced level of complexity. 40°C max. Need help?

The R*evolution® V remote plasma source integrates a uniquely designed, actively cooled quartz torus plasma chamber, an RF power supply, intelligent power control, and EtherCAT® diagnostics into a compact, self-contained unit for easy installation directly on the tool's process chamber.

MKS R*evolution® III Remote Plasma Source AX7695 是一款用于半导体晶圆加工的远程等离子体源。 它采用创新的射频 (RF) 功率源和腔室设计，可提供高密度、均匀的等离子体，适用于各种刻蚀、沉积和清洗应用。

2024年1月5日 · 用Matlab实现调制解调的模拟,详细介绍了FSK,ASK,PSK三种调制与解调的对比，加入了信噪比，比较了相干与非相干解调的特点

是否进口:否，品牌:MKS ASTEX，型号:AX7695PSK-11，输入电压:200-208（V），频率范围:50/60（HZ），产品认证:CE，适用范围:semiconductor，电源名称:R*evolution III。 我们还为您精选了其他电源公司黄页、行业资讯、价格行情、展会信息等，欲了解更多详细信息,请点击访问!

R*evolution® III integrated remote plasma source provides the highest performing and cleanest source of reactive gas required for semiconductor wafer processing.

2023年6月17日 · 2PSK调制原理如下图所示，和2ASK调制原理相似，只不过 基带 码元是双极性不归零码，基带码元d (t)和高频载波相乘实现2PSK信号的调制。 2PSK的解调原理如下图所示，2PSK信号经过信道传输之后，再和载波相乘，然后经过低通滤波后抽样判决恢复出原始基带 码元 信号。 %% 基本参数. %% 产生单极性波形. %% 单极性变为双极性. % 基带信号变为双极性即jidai为1的时候，jidai为1;jidai为0的时候，jidai为-1 for n=1:length(jidai) if jidai(n)==1 …

2019年5月30日 · 在描述中提到，我们不是简单地使用MATLAB自带的MPSK（Multiple Phase Shift Keying，多相位移键控）模块，而是自行构建了2PSK和4PSK的Simulink系统图，并进行了4PSK的误码率仿真，采用了欧式距离作为计算方法。

The R*evolution® III integrated remote plasma source, with improved capability over the earlier model, provides the highest performing and cleanest source of reactive gas species required in the processing of semiconductor wafers. Ambient 40°C max. Need help?

The first in a new family of remote plasma sources specifically designed for “on-wafer” applications, the innovative R*evolution III combines MKS’s field-proven, patented Low-Field Toroidal plasma technology with a robust plasma applicator design that produces ultra clean atomic neutrals or radicals.