The Elionix Electron Beam Lithography (EBL) systems are dedicated to the nanofabrication of quantum devices. Elionix delivers impressive resolution, minimal field stitching and overlay errors, and excellent uptime.

Electron-beam lithography (often abbreviated as e-beam lithography or EBL) is the practice of scanning a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive film called a resist (exposing). [1]

From full production job scheduling, to SEM UI, to system diagnostics, this software platform is very intuitive to use. The Elionix electron beam lithography (EBL) systems are built to meet customer demands for finer lines and writing speeds. Here you can see our research tools.

We offer the widest range of e-beam tools for mask, reticle, and direct-write lithography, from high volume production to advanced research and development of NIL, photonic crystals, and sub-10 nanometer linewidths.

Our cutting-edge electron beam lithography systems provide solutions for diverse application challenges, ensuring optimal throughput, full automation, ultimate stability, highest precision, and versatility for advanced nanotechnology.

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2024年11月6日 · The Raith EBPG5200+ is an electron beam lithography tool capable of high resolution patterning at 100 kV. It has a 125 MHz pattern generator, a maximum current of 350 nA, and a 1 mm mainfield size. It has an automatic aperture changer, automatic and dynamic focus and stigmation, and automatic alignment.

2024年6月17日 · The Elionix ELS-7500EX is an electron beam lithography tool capable of high resolution patterning at 50 kV with currents from 10 pA to 20 nA. Applications. Patterning of positive and negative e-beam resists with features from ~10 nm to micron scale; Allowed Materials. Standard semiconductor materials; Low vapor pressure metals; Resists Standard ...

Abstract: This paper introduces a software toolkit, HNU-EBL, developed at Hunan University (HNU), to simulate and optimize electron beam lithography (EBL). The toolkit consists of three consecutive modules.

The JEOL JBX-6300FS is a state-of-the-art 100kV EBL tool providing high-speed patterning capabilities with feature sizes as small as 8 nm over mm-scale areas.