AZ 10XT Series materials contain PGMEA (1-Methoxy-2-propanol acetate). Refer to the current version of the MSDS and to local regulations for up to date information on safe handling and proper disposal.

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AZ® 10XT is an i- and h-line (not g- line !) sensitive positive thick photoresist, as the successor to the AZ® 9260 and is largely identical in construction, but with a different surfactant. In contrast to the similarly named AZ® 12XT, the AZ® 10XT is not chemically amplified.

AZ® 10XT (520 cP) photoresist was tested side by side vs. AZ® 9260 at a film thickness of 12.0 μm. The two products were compared for coat uniformity, thermal stability, and lithographic performance on silicon as follows. AZ® 10XT showed no difference in coat uniformity or thermal stability compared to AZ® 9260.

AZ® 10XT positive photoresist is designed for 5 to 25 micron film thickness in high performance rerouting processes and other plating applications. Three viscosities are available to cover a variety of film thicknesses. PFOS free formulation. Excellent coat capability, 3 to 1 aspect ratios, vertical sidewalls.

az 10xt光刻胶产品特点： 1) 高分辨率，高纵宽比. 2) 高附着性，对电镀工艺高耐受性. 3) 多种粘度可供选择. az 10xt光刻胶参考工艺： 前烘 ： 100℃ 90秒以上 (dhp) 曝光 ： i线步进式曝光机/接触式曝光系统 . 显影 ： az400k显影液(1:4) 23℃ 60~300秒 dip ： az300mif显影液23 ...

az 10xt 是一种超厚膜，高分辨率，高纵宽比 i 线正型光刻胶，适用于微电镀工艺。 特征： 1 ）高分辨率，高纵宽比. 2 ）高附着性，对电镀工艺高耐受性. 3 ）多种粘度可供选择. az 10xt 系列光刻胶根据粘度不同，划分为以下型号。其中 az 10xt(520cp) 是常用型号。

AZ® 10XT achieves a resist film thickness of approx. 6 µm at a spin speed of 4000 rpm; with an appropriately adjusted spin profile, the resist film thickness range of approx. 4.5 - 20 µm can be covered.

配备 KLA 突破性的 DDITM(滚筒式直接成像)技术,Infinitum 10/10XT 可实现最佳板材处理和高速成像,提供高良率和产能。 这一全新解决方案采用 KLA 经市场验证的 LSOTM(大镜面扫描光学)技术和 MultiWave LaserTM ( 多波长激光) 技术,即使在最薄的软板板材上也能实现卓越的线条品质和高精度。 Orbotech Infinitum 10/10XT 是一体式、紧凑、封闭的创新解决方案,可确保卓越的性能和最佳效率。 KLA 保持系统生产力是支持KLA 和减少报废、系统迁移、性能和生产率提升以及转售 …

AZ 10XT匀胶厚度约5~16微米. AZ 10XT光刻胶应用于电镀工艺的超厚膜，高分辨率I线正型光刻胶。 超厚膜，高分辨率，高纵宽比I线正型光刻胶，适用于微电镀工艺。 AZ 10XT匀胶厚度约5~16微米. AZ 10XT光刻胶应用于电镀工艺的超厚膜，高分辨率I线正型光刻胶。 超厚膜，高分辨率，高纵宽比I线正型光刻胶，适用于微电镀工艺。 AZ 10XT匀胶厚度约5~16微米.