Atomic layer deposition (ALD) is a thin-film deposition technique based on the sequential use of a gas-phase chemical process; it is a subclass of chemical vapour deposition. The majority of …

Ald is an obsolete Mongolian measure equal to the average human male's armspan (length between a male's outstretched arms). An ald is therefore approximately equal to 160–180 cm …

原子层沉积 (Atomic Layer Deposition, ALD)是一种基于化学气相沉积 (CVD) 的高精度薄膜沉积技术，是将物质材料以单原子膜的形式基于化学气相一层一层的沉积在衬底表面的技术。

以原子层为单位沉积技术 “Atomic Layer Deposition (ALD)” 的开发克服了原来的半导体技术局限。 ALD 技术和 CVD, PVD 薄膜生长技术相比具有以下优势：1.大部分ALD 工艺在400度以下的低 …

Closed loop feedback control of O3 concentration using built-in O3 monitor. O2 gas flows up to 1000 sccm, O3 concentration up to 22 wt%. Divert line must be pumped since the generator …

2012年11月1日 · Trimethyl Aluminum (TMA) reacts with the adsorbed hydroxyl groups, until the surface is passivated. TMA does not react with itself, terminating the reaction to one layer. …

2018年1月1日 · Atomic layer deposition (ALD) for thin film deposition is one of the most important techniques that is enabling the continuous miniaturization of semiconductor devices.

2012年11月1日 · What is ALD? aka How does it work? First let’s look atomistically. A rose by any other name... Then we’ll look at what that means in ways we can measure. Microscopically? …

原子层沉积 (ALD)是一种高精度涂层制备的技术，它通过在衬底表面上交替引入不同的化学气相前驱体，实现单原子层精度的薄膜沉积。 在现代半导体和光电领域，薄膜沉积技术是实现高性 …

Atomic Layer Deposition (ALD) is a thin film deposition technique enabling the fabrication of next-generation devices across the globe’s most innovative industries. Used to manufacture high …