Canon has achieved miniaturization at lower power consumption and lower cost with nanoimprint lithography (NIL), a new technology that is an alternative to conventional lithography technology. By enabling inexpensive production of patterns of 15nm or smaller, NIL is poised to revolutionize the semiconductor industry.

2023年10月13日 · Canon, the Japanese firm best known for its printers and cameras, launched a critical tool on Friday it says can help manufacture the most advanced semiconductors around. The latest...

2025年1月2日 · 日本大廠佳能（Canon）於9月26日宣佈，首度出貨奈米壓印微影設備（Nanoimprint Lithography, NIL）給美國「德州電子研究所」。 該設備據稱可生產5奈米製程晶片，並且經過改良後，將可進一步用於生產2奈米製程晶片。 奈米壓印技術是什麼，有哪些優勢及應用？ 若要普及甚至是取代EUV地位，又有哪些挑戰需克服？ NIL奈米壓印技術和EUV有何不同？...

In addition to fluoride dimer excimer lasers with wavelengths of 157 nm and X-ray lasers, EUV (Extreme Ultra-Violet) light sources are attracting keen attention. EUV sources have wavelengths of just 13 nanometers, and so should be well able to create patterns of under 50 nanometers.

2023年11月10日 · Canon is seeking to capture market share in high-end chip making by positioning the NIL as a simpler and more attainable alternative to the leading-edge ASML’s EUV tools of today. With a claim that NIL can imprint 5nm and 2nm chips at far less cost, Canon has challenged ASML’s monopoly in high-end chip making by releasing NIL machine.

2025年1月2日 · Canon's new nanoimprint lithography technology promises to revolutionize chipmaking by producing 14-nm circuit features at a fraction of the cost of EUV systems.

2023年11月6日 · Canon recently introduced its nanoimprint lithography (NIL) tool that can be used to make chips on a 5nm-class process technology, and compete against ASML's extreme ultraviolet (EUV) lithography...

2023年10月17日 · The device uses nanoimprint lithography (NIL) technology as an alternative to photolithography, and can theoretically challenge extreme ultraviolet (EUV) and deep ultraviolet (DUV) lithography ...

2023年12月19日 · 数nm世代の最先端半導体には、オランダasmlの極端紫外線（euv）露光装置が必須――。そんな状況にキヤノンが風穴を開けた可能性がある。長年、研究開発を続けてきたナノインプリントリソグラフィ（nil）装置を実用化したのだ（図1）。2023年10月13日から ...

2025年3月19日 · 面對 asml 在 euv 曝光領域的領先地位，曾經的曝光機巨頭佳能選擇了另一條道路：奈米壓印微影（nil）技術。nil 技術的原理類似於印刷機，將電路模板直接壓印到晶圓上。理論上，nil 技術能夠以奈米級精度、低成本和小體積挑戰 euv 曝光。