Implementation of a dynamic gas lock mechanism reducing …
2025年2月14日 · The dynamic gas lock (DGL) is an effective structure in extreme ultraviolet (EUV) lithography, designed to mitigate the diffusion of hydrocarbons from the wafer chamber …
Theoretical research on suppression ratio of dynamic gas lock for ...
2022年6月22日 · Dynamic gas lock (DGL) is an important technology for contamination control of extreme ultraviolet (EUV) lithography. DGL prevents contamination diffusion from the dirty …
Pollutant inhibition in an extreme ultraviolet lithography machine …
2023年12月10日 · Dynamic gas lock (DGL) is an effective method to inhibit carbon deposition on optical surface in extreme ultraviolet (EUV) lithography machines. However, due to the …
Development of a dynamic gas lock inhibited model for EUV …
2024年1月29日 · The optical surface of extreme ultraviolet (EUV) lithography machines is highly vulnerable to contamination by hydrocarbons, resulting in the formation of carbon deposits that …
Results include temperature, electron density, spectral emission, etc. The plasma code’s outputs were processed to produce synthetic source data. The comparison to experiments helps to …
Development of a dynamic gas lock inhibited model for EUV
2024年1月28日 · The optical surface of extreme ultraviolet (EUV) lithography machines is highly vulnerable to contamination by hydrocarbons, resulting in the formation of carbon deposits that …
动态气锁抑制极紫外光刻机中的污染物,Journal of Cleaner …
2023年11月11日 · 动态气锁（dgl）是抑制极紫外（euv）光刻机光学表面积碳的有效方法。 然而，由于DGL内部流程的复杂性，相关的理论分析仍然不完整。 本工作采用基于OpenFOAM平 …
Theoretical research on suppression ratio of dynamic gas lock for ...
Dynamic gas lock (DGL) is an important technology for contamination control of extreme ultraviolet (EUV) lithography. DGL prevents contamination diffusion from the dirty …
Only one working point where EUV intensity, CxHy pressure, O2 pressure are balanced. Otherwise either carbon growth or oxidation will occur. Surface coverage by light …
• Using DGL membrane to eliminate DUV and IR at wafer level has an impact on EUV transmission • Using spectrum measured at source for feedback control has limitations