这是紐富来科技的产品信息｡刊登有电子束掩模曝光设备 EBM-9500PLUS的信息｡

EB Mask Writer EBM-9500,EB Mask Writer,Product Information,NuFlare Technology, Inc.

The EB Mask Writer is a device that integrates advanced elemental technologies such as precision machine control, large-scale data processing, and laser measurement technology, with electron beam writing control technology as the core technology.

日本NuflareEBM-9500PLUS加工能力（a）利用EBM-9500PLUS加工的30~18 nm半周期光栅结构；（b）~（d）利用EBM-9500PLUS加工的逆向光刻技术（ILT）掩模图案 此外，Nuflare公司近几代的变形束设备中逐渐引入多效应的电子束与材料相互作用仿真模型以补偿相应误差，其设备的曝光结构精度领跑行业。 多束电子束光刻 ...

2016年10月25日 · To realize this, we have developed a new SBMW, EBM-9500 for mask fabrication in this generation. A newly introduced electron beam source enables higher current density of 1200A/cm 2.

Download Citation | On Oct 25, 2016, Hideki Matsui and others published Electron beam mask writer EBM-9500 for logic 7nm node generation | Find, read and cite all the research you need on ResearchGate

2016年3月17日 · In fact, NuFlare’s latest tool, called the EBM-9500, has a current density of 1,200A/cm 2. This tool, according to NuFlare, represents the company’s last single-beam system.

NuFlare Technology, Inc. was founded in 2002 as a spinoff of the Semiconductor Equipment Division of Toshiba Machine Co. Ltd. Since that time, we have developed and provided state-of-the-art electron beam mask writers, mask inspection systems and epitaxial growth systems for the manufacture of semiconductor devices, thereby contributing to the development of the semiconductor industry.

MBM™-2000支持3nm节点系列，MBM™-2000PLUS支持3nm+节点系列的光掩模量产。 EBM系列电子束掩模光刻设备是采用可变成型光束方式、载物台可变速控制方式和高电流密度电子源，实现高COO（Cost of Ownership）的单束光刻设备。

TOSHIBA/NUFLARE EBM-9500是一个尖端的掩模产生和生产系统，设计用于中量生产具有高精度、自动对准和自动聚焦机制、用户友好的图形界面以及先进的过程监控能力的纳米级掩模。