4 天之前 · The 2025 Extreme Ultraviolet Lithography (EUVL) and Source Workshop will be held at MIT Lincoln Laboratory, from June 21-26, 2025. This annual workshop, organized by EUV Litho, Inc., is a unique forum to discuss the challenge and progress of EUVL as it is being implemented in state-of-the-art semiconductor manufacturing.

2025 EUVL Workshop and Supplier Showcase. All proceedings for previous workshops are made available for open access after the succeeding iteration of the workshop has concluded, with the exception of the EUVL Webinar, the proceedings of which are always open access. EUVL Workshops are organized by the EUVL Workshop Steering Committee.

EUV Litho Inc. is pleased to announce Phase I of Blue-X, a consortium to investigate the potential of optical projection lithography in the wavelength region of 2–7 nm. The consortium was formally revealed during the 2024 Source Workshop in Amsterdam this October.

EUV lithography makes scaling more affordable for chipmakers and allows the semiconductor industry to continue its pursuit of Moore’s Law. EUV systems are used to print the most intricate layers on a chip, with the rest of the layers printed using various DUV systems.

Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.

H. Tanabe, M. Shimode and A. Takahashi, "Rigorous electromagnetic simulator for extreme ultraviolet lithography and convolutional neural network reproducing electromagnetic simulations," to be published. EUV lithography simulator depends on oneAPI (2023.2.0), Eigen (3.4.0), CUDA (11.8) and MAGMA (2.6.2).

2023年10月17日 · EUV Litho, Inc. 由 Vivek Bakshi 博士创立，是一家致力于通过咨询、研讨会和教育课程推广 EUV 光刻的组织，负责组织年度 EUVL 研讨会、EUV 和软 X 射线源国际研讨会以及全球 EUVL 短期课程。

The 2025 Extreme Ultraviolet Lithography (EUVL) and Source Workshop will be held at Lincoln Laboratory. This annual workshop, organized by EUV Litho, Inc., is a unique forum to discuss the challenge and progress of EUVL as it is being implemented in …

Extreme ultraviolet lithography (EUVL) is the principal lithography technology—beyond the current 193-nm-based optical lithography—aiming to manufacture computer chips, and recent progress has been made on several fronts: EUV light sources, scanners, optics, contamination control, masks and mask handling, and resists.

Advantages of EUV lithography are wide process windows, high throughput (once source power and availability specs are met), and extendibility. Disadvantages of EUV lithography are higher costs & complexity (than ArFi lithography) and infrastructure immaturity.