
Two features combined to support a high-average-power, high-repetition-rate or continuous-wave and narrow-band radiation, at wavelengths ranging from the THz region to the EUV. 154801 (2010). Steady-state Microbunching in an electron storage (SSMB)[1]: ring by laser electron ring from radiofrequency-focusing modulator.
EUV debris mitigation using magnetic nulls
2023年7月27日 · We investigate a previously unconsidered mitigation geometry consisting of a magnetic null by performing full-orbit integration of the ion trajectories in an EUV system with realistic dimensions and optimize the coil locations for the null configuration.
The EUV source, based on a discharge-produced plasma in tin vapor, irradiates samples in a clean vacuum chamber. The latter is designed for the investigation of surface and volume physical and chemical processes, induced or assisted by EUV. The benefits of this setup are high EUV power density, tech-
In extreme ultraviolet (EUV) lithography, plasmas are used to generate EUV light. Unfortunately, these plasmas expel high-energy ions and neutrals which damage the collector optic used to collect and focus the EUV light. One of the main problems facing EUV source manufacturers is the necessity to mitigate this debris.
Mitigation of debris from a laser plasma EUV source and from …
2020年11月1日 · An LPP EUV source is one of the most powerful EUV sources for triggering material ablation. Broad EUV light ranging from 7 to 22 nm is generated by focusing a pulsed Nd:YAG laser onto solid xenon. Total reflection mirrors are suitable optics for focusing such broad band EUV radiation on an ablation target.
[2307.10996] EUV Debris Mitigation using Magnetic Nulls
2023年7月20日 · We investigate a previously unconsidered mitigation geometry consisting of a magnetic null by performing full-orbit integration of the ion trajectories in an EUV system with realistic dimensions, and optimize the coil locations for the null configuration.
We are developing 250W EUV source. 15W* (100kHz) EUV power in burst (50% duty) was achieved. CE is 1.5%. Now we are improving CE >2.5% by optimizing shooting conditions. Higher CE gives high ionization rate to activate magnet mitigation properly. Gigaphoton will release a PILOT source in 2015.
Key components of this EUV light source system from Gigaphoton include a magnetic debris mitigation system, a high power short pulse CO2 drive laser system, a unique pre-pulse laser system, a small droplets generator and a laser-droplet shooting control system.
Magnetic mitigation of debris for EUV sources - SPIE Digital Library
2013年4月1日 · The use of magnetic fields to deflect ionic debris has been proposed and is investigated here. In this paper, we present a detailed computational model of magnetic mitigation, along with experimental results that confirm the correctness of the model.
Magnet lattice design and optical enhancement cavity development for the envisioned Tsinghua EUV SSMB storage ring is ongoing, with very good progress achieved. D. F. Ratner and A. W. Chao, Steady-State Microbunching in a Storage Ring for Generating Coherent Radiation, Phys. Rev. Lett. 105, 154801 (2010).