• RGA outgassing measurement has been characterized; it was found that reported values can depend on – the time dependent RGA sampling plan with respect to resist exposure (amount …
Measurement and analysis of EUV photoresist related outgassing …
2009年3月1日 · RGA is based on in situ mass spectrometer measurements during photoresist EUV exposure and enables chemical identification of species that are outgassing, but has …
Parameter control: EUV sensors that detect every pulse, real time RGA to monitor the gas environment. Sample backside temperature can be controlled over a range from -20°C to …
From the RGA spectrum of resist 1 some species can be identified, e.g. species related to PAG (Photo acid generator) or PG (protection groups). The contribution of the identified species …
We have successfully developed the first commercial EUV Resist Outgassing and Reticle Contamination Tool to evaluate the candidate EUV resists for the ADT where 13.5 nm light is …
The suppression of extreme ultraviolet (EUV) resist outgassing is one of the challenges in high-volume manufacturing with EUV lithography (EUVL), because it contributes to the …
Increased data: EBL2 will have real-time in-situ ellipsometry to monitor sample status, a real time RGA to monitor the gas environment, and EUV sensors that detect every pulse. EBL2 will be …
半导体RGA与O2漏气即时监测系统-楷奈基贸易 (上海)有限公司
以独特的RGA残留气体分析系统与O2漏气侦测系统，为半导体工艺设备提供可靠的在线工艺检测解决方案。 使用CyberOptics AGS提高一致性和工艺良率，以实现精确和可重复的设置。 对 …
OmniGrade 残余气体（RGA） 分析系统 | 普发 Pfeiffer
OmniGrade 残余气体（RGA） 分析系统 产品优势： 1. 使用模块化系统根据您的需求定制执行. 2. 检测限低. 3. 全自动测量过程. 4. 全球服务网络. 5. 根据 GSA 07 1221 和 GSA 07 2221 进行测 …
2019年4月3日 · To study temperature-dependent outgassing phenomena, we investigate the surface chemistry of a model photoresist formulation containing poly(methyl methacrylate) …