Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of …

Providing high resolution in high-volume manufacturing, ASML’s extreme ultraviolet (EUV) lithography systems are pushing Moore’s Law forward. Discover our NXE systems that use …

The TWINSCAN EXE:5000 is the first 0.55 NA, or ‘High NA’, EUV lithography system. Its 8 nm resolution will enable chipmakers to print with a single exposure features 1.7 times smaller – …

Using proprietary techniques, the EUV N&K and Phase Measurement Tool allows phase and as-deposited film parameters to be extracted for an EUV multilayer and absorber stack. With the …

we’ve been building our EUV expertise and capacity over the last year. Working closely with ASML, we will harness High-NA EUV’s high-resolution patterning as one of the ways we …

The MET is a 0.3-NA extreme ultraviolet (EUV) microlithography tool situated on undulator beamline 12.0.1.3 of the Advanced Light Source at Lawrence Berkeley National Laboratory. …

ZYGO corporation got contracted to build several EUV-L Micro-Field Exposure Tools with 0.5NA, known as MET5. Those tools are used for infrastructure development required for the EUV …

tools: • EUV Reflectometer o Measures the reflectivity and uniformity of multilayer coatings for EUV lithography mask blanks and absorbers • EUV Resist Outgassing Tool o Measures the …

5 天之前 · The images of the lines were printed after the tool’s optics, sensors and stages completed coarse calibration. The company said the ability to print 10 nm dense lines with a …

Over the years, the resolution of these tools has improved from several micrometers in the early 1970s to 13 nm in state-of-the-art extreme ultraviolet (EUV) tools [λ = 13.5 nm, numerical …