Our EKC Technology products provide best-in-class process solutions for wafer cleaning, surface preparations, liquid and dry film resist removal, post CMP cleaning, selective etching and post-etch residue removal.

Our advanced clean chemistries provide best-in-class process solutions for wafer cleaning, surface preparations, liquid and dry film resist removal, post-CMP cleaning, selective etching and post-etch residue removal (PERR).

2024年10月28日 · 在半导体制造过程中，IPA（异丙醇）、NMP（N-甲基-2-吡咯烷酮）和EKC是三种非常常见的清洗和去除剂，广泛用于清洁、去胶和蚀刻工艺中。 每一种溶剂都具有独特的物理和化学特性，且在加热过程中表现出不同的反应，因此了解它们的特性和应用至关重要。

维萨拉 K-PATENTS® 半导体行业折光仪提供 2 种不同的控制策略，在处理完每批晶圆后自动重新注满化学品或自动补充化学品，以保障晶圆安全生产。 这款半导体行业折光仪还可提醒工作人员，EKC® 可能会在 IPA 中残留，防止 IPA 在后续的 IPA/干燥工艺中受到 EKC ...

2018年8月12日 · 在 1990 年代末及 2000 年代初，杜邦-EKC 推出了EKC600 系列，Versum（ACT）推出了 NE111 等，其基本特征是引入醋酸/醋酸铵或者柠檬酸/柠檬酸铵缓冲系统，在不同使用时间内蚀刻速率相对稳定。

2024年4月28日 · EKC EMBOSSED ON THE LID -.

2022年12月19日 · KODACOLOR FILM FOR COLOR PRINTS. 2 DISCS 30 TOTAL EXPOSURES. DEVELOP BEFORE DATE WILL VARY BUT IS SOME YEARS IN THE PAST (1980S OR 1990S). MIGHT COME WITH OR WITHOUT BOX. SOLD AS IS.

DuPontTM EKC162TM resist remover for WLP is an aqueous organic mixture, formulated to effectively remove thick photoresist used in wafer bumping and WLP. When DuPontTM EKC162TM resist remover for WLP is handled and used properly, it can offer users many benefits and advantages in WLP.

Other stream of EKC Prime entertainments is EKC Motion Pictures with the experience of film making film promotions publicity and PR and most important film distribution in regional and PAN India. YMI CLUB is a branch which explores actors from all over and provide them best projects.

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