Providing high resolution in high-volume manufacturing, ASML’s extreme ultraviolet (EUV) lithography systems are pushing Moore’s Law forward. Discover our NXE systems that use EUV light to deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible.

Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.

The TWINSCAN EXE:5000 is the first 0.55 NA, or ‘High NA’, EUV lithography system. Its 8 nm resolution will enable chipmakers to print with a single exposure features 1.7 times smaller – and therefore achieve transistor densities 2.9 times higher …

The TWINSCAN NXE:3400B supports EUV volume production at the 7 and 5 nm nodes. Combining productivity, excellent image resolution, matched overlay to EUV NXE and ArFi NXT tools and focus performance, the NXE:3400B provides lithography capability complementary to ASML’s ArFi technology.

2016年6月15日 · Start pitch: 24nm for high-NA, 40nm for NA 0.33 k1 = 0.49 in both cases. Anamorphic high NA w/ central obscuration: comparable exposure latitude, @ smaller pitches. Lower Best Focus variation for high NA. ∞!

2020年9月25日 · “Line radiation” from a “U.T.A.”, light produced by many bound-bound transitions or light emitted by the transition of an electron within a Sn ionabout 15% will make it to the scanner. Roughly 40% of the power dumped into the plasma is emitted by radiation, of that radiation about 15% will make it to the scanner. 2. Density is.

2022年12月23日 · Huawei has filed a patent application covering an extreme ultraviolet (EUV) lithography scanner, according to UDN. If the company builds such a scanner and achieves decent productivity,...

5 天之前 · Intel also will be assembling a second High-NA EUV lithography scanner soon. In total, Intel is said to have purchased five total scanners from ASML with assembly expected over the next few years. Intel said it will use both NA EUV lithography scanners in its most advanced process node, 18A, starting with product proof points in 2025 and then ...

2021年10月5日 · Extreme ultraviolet (EUV) lithography is a soft X-ray technology, which has a wavelength of 13.5nm. Today’s EUV scanners enable resolutions down to 22nm half-pitch. In a system, an EUV light source makes use of a high power laser to create a plasma. This, in turn, helps emit a short wavelength light inside a vacuum chamber.

2024年11月28日 · EUV scanners use laser-produced plasma sources. These sources generate EUV radiation in a broad range of wavelengths around 13.5 nm by focusing a laser beam on tin droplets,...