热诱导的化学气相渗透（英语：chemical vapor infiltration，CVI）是一个与CVD有关的技术，以在基体材料渗入多孔或纤维预成型件以制备由复合材料制成的部件具有改善的机械性能，耐腐蚀性，耐热冲击性和低残余应力。

Thermally induced chemical vapor deposition (CVD) is a powerful way of depositing homogeneous layers of various dielectric, semiconducting and metallic materials, either in monocrystalline, polycrystalline, amorphous or epitaxial state on small or large area substrates.

Thermally induced CVI is a CVD-related technology for the infiltration of matrix material into porous or fibrous preforms, in order to produce parts made of composite materials with enhanced mechanical properties, corrosion resistance, thermal shock resistance, and low residual stresses.

薄膜与涂层技术研究室主要利用气相沉积法 (激光化学气相沉积、金属有机化学气相沉积、粉体旋转化学气相沉积、脉冲激光物理气相沉积)、液相凝固法 (弧光放电、悬浮区熔)和固相反应法 (热压烧结、放电等离子体烧结)制备各种氧化物、碳化物、氮化物和硼化物等超硬陶瓷和涂层、生物陶瓷涂层、热障涂层、无铅铁电陶瓷和薄膜、高温超导薄膜、汽车尾气净化触媒、制氢触媒、宽禁带半导体薄膜和离子导体薄膜等。...

2025年2月1日 · Floating catalyst thermal CVD (FCT-CVD), on the contrary, serves as a one-stop method for preparing CNT/diamond composites, eliminating the need for a separate catalyst deposition step. This technique can produce dense and …

2013年3月31日 · Three CVD-based CNT growth techniques have been investigated: (i) T-CVD, (ii) MPE-CVD, and (iii) FCT-CVD. The first two techniques involved predeposition of seed catalysts prior to CNT growth and were optimized first on an electronic grade silicon substrate with a layer of thermal silicon dioxide layer on the surface.

study investigates three potential chemical vapor deposition (CVD) techniques for growing CNTs on diamond: thermal CVD (T-CVD), microwave plasma-enhanced CVD (MPECVD), and floating catalyst thermal CVD (FCT-CVD).

the MPE-CVD provides non-uniform defective CNTs, and the FCT-CVD provides the smallest diameter CNTs with catalyst particles imbedded throughout the length of the nanotubes. The three different CNT growth methods have been discussed in light of our current understanding of

CVD 法は主として粘性流（一部中間流）領域の圧力下でプ ロセスを実施することが特徴である．化学反応を使用した PVD 法は主として分子流または中間流領域でプロセスを実 施する．. …

Thermally induced chemical vapor infiltration (CVI) is a CVD-related technology for infiltrating matrix material into porous or fibrous preforms to produce composite parts with improved mechanical properties, corrosion resistance, thermal shock resistance and low residual stresses.