Inpria, a JSR Company, is the world leader in metal oxide photoresist design, development and manufacturing. By design, Inpria photoresists enable patterning at exceptionally small pitches …

After develop, Inpria resists are hardmask-like materials, similar to TiN or TiO2. It is a patterned hardmask that is formed without a dry etch. Intentional LWR smoothing also acts as a trim …

Radiolytic efficiency modulated as predicted by chemistry of ligand sequence. Demonstrates control over an important component of improving sensitivity.

对 euv 的需求以及 1-2 次更少光子和更少吸收的需求相结合，为经典光刻胶行业提供了一个成熟的机会。 这就吸引厂商进入干燥抗蚀剂（dry resist）市场。

Objective: Demonstrate Inpria EUV Photoresist compatibility with state-of-art filtration. Experiment: Do a recirculating filtration of the resist with a 5nm Entegris filter, until particles …

2018年6月14日 · •Currently, there are many attractive strategies to improve the performance of EUV resists: Boosting non-linear response (PS-CAR, Irresistible materials) Simplifying …

2022年9月2日 · 近日，JSR宣布旗下子公司Inpria和SK海力士为了实现EUV用金属氧化物PR的应用，开展联合研究过去是旋涂法，在旋转晶片的同时用设备滴下有机材料PR，因此在应用过程 …

2016年7月18日 · The electronic materials start-up Inpria plans to build a facility in Corvallis, Ore., to manufacture its metal oxide-based photoresists. Developed in Oregon State University’s …

2021年9月19日 · CINNO Research产业资讯，日本JSR收购了次世代EUV光刻胶初创企业美国inpria。 通过此次收购， JSR扩大了EUV 光刻胶布局。 随着半导体精细制程需求而增长 …

2021年9月18日 · inpria是开发半导体曝光制程中使用的PR的初创公司。 可以画出超精细电路pattern的EUV需要与传统制 程不一样的专用光刻胶。 因其技术难度高，一直被日本 JSR …