其他姓名 Jack Lee, J. C. Lee. The University of Texas at Austin, IEEE Fellow. 在 austin.utexas.edu 的电子邮件经过验证 - ... L Kang, K Onishi, Y Jeon, BH Lee, C Kang, WJ Qi, R Nieh, S Gopalan, ... International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat.

Jack Lee is the Cullen Trust for Higher Education Endowed Emeritus Professor in Engineering in the Department of Electrical and Computer Engineering at The University of Texas at Austin.

Jack C Lee. Professor Emeritus, Chandra Department of Electrical and Computer Engineering Email: [email protected] . Expertise; High-K gate dielectrics and gate electrodes; Alternative channel materials for MOSFET applications; Fabrication methods and novel device structures for future integrated circuit device applications; Compound ...

Jack Lee is the Cullen Trust for Higher Education Endowed Professor in Engineering in the Department of Electrical and Computer Engineering at The University of Texas at Austin.

He is a Professor with the Electrical and Computer Engineering Department and holds the Cullen Trust for Higher Education Endowed Professorship in Engineering at The University of Texas at Austin, Austin, TX, USA. His current research interests include semiconductor devices, fabrication processes, and nanotechnologies.

Jack C. Lee's 238 research works with 6,664 citations and 13,891 reads, including: Self-Selective Dielectric-Fuse Effect with Ambient Factors in Oxide-Based Memory

Jack Lee is the Cullen Trust for Higher Education Endowed Professor in Engineering in the Department of Electrical and Computer Engineering at The University of Texas at Austin. He received the B.S. and M.S. degrees in electrical engineering from University of California at Los Angeles in 1980 and 1981, respectively; and the Ph.D. degree in ...

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Jack C. Lee. Microelectronics Research Center, Department of Electrical and Computer Engineering, The University of Texas, Austin, 10100 Burnet Road, TX 78758, USA

Dr. Lee's current research interests include thin dielectric breakdown and reliability, high-K gate dielectrics and gate electrode, high-K thin films for semiconductor memory applications, electronic materials, and semiconductor device fabrication processes, characterization and modeling.