The AIT XUV is KLA-Tencor's next-generation double-darkfield optical inspection tool incorporating UV illumination to achieve the critical sensitivity requirements needed for the 65 …

KLA’s defect inspection and review systems cover the full range of yield applications within the chip manufacturing environment, including incoming process tool qualification, wafer …

The AIT II, an advanced system for patterned process tool monitoring for 0.18 µ and smaller geometries, has bridge capability to 300-mm wafers. By enabling the immediate detection of …

KLA-Tencor AIT I 是一种高端的晶圆测试和计量系统，主要用于半导体制造过程中的缺陷检测与分析。 该系统具备多种先进功能，包括自动化检测、高精度测量以及多通道光学成像技术。

KLA-Tencor AIT XP 晶圆检测仪 是一种先进的晶圆测试和计量系统，专为半导体制造过程中的缺陷检测和过程控制而设计。 该系统利用高精度的成像技术和专有算法，能够快速、准确地识别 …

2024年9月23日 · KLA-Tencor AIT II 晶圆检测仪 是一种先进的晶圆测试和计量系统，专为半导体行业设计。 该系统具有多种功能和特点，使其在晶圆缺陷检测和过程控制方面表现出色。

KLA-TENCOR AIT II (200mm/300mm) PATTERNED SURFACE DEFECT INSPECTION SYSTEM consisting of: - Model: AIT II - Wafer Size: 200mm - 150/200mm Open Handler - …

Adjusts dynamically to all die regions to deliver maximum sensitivity and improved detection of killer defects in a single scan, regardless of pattern density. Features faster recipe setup, …

kla/tencor ait uv是一种下一代计量设备，利用先进的成像、光束剖面图和图样能力测量具有纳米精度的晶片，以确保生产的晶片符合必要的规格。 KLA / TENCOR AIT UV 晶圆测试仪 用于销 …

2001年7月3日 · Using proprietary technology KLA-Tencor calls NexTek, the AIT XP can inspect an entire patterned wafer in 80 seconds with a high rate of defect capture, thereby increasing …