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LPCVD - Low Pressure Chemical Vapor Deposition
LPCVD refers to a thermal process used to deposit thin films from gas-phase precursors at subatmospheric pressures. Process conditions are typically selected so that the growth rate is …
LPCVD - Low Pressure Chemical Vapor Deposition
TYTAN nitride LPCVD tubes are proven for the capability of producing prime-quality nitride layers free of hydrogen bonds up to a few um in thickness. The proprietary design and engineering …