1994年9月1日 · Finally, OMCATS polymerizes via the formation of polymethylsiloxane chains and rings. These various mechanisms result in differences in the properties of the polymer films. In …

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八甲基环四硅氧烷是低温化学气相沉积制备高质量低介电常数（低k）金属层间介质薄膜的重要硅源前驱体。 用于光纤预制棒和集成电路制造的有机硅原料必须达到6N甚至9N以上，而一般商 …

摘要 在本研究中，以八甲基环四硅氧烷 (OMCTS) 为前驱体，通过等离子体增强化学气相沉积 (PECVD) 在混合纤维素酯 (MCE) 基底上制备了用于气体分离的 SiOCH 薄膜。 射频功率是调节 …

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2001年8月1日 · Films composed of Si, C, O and N have been deposited by low pressure chemical vapour deposition (LPCVD) from different chemical systems: pyrolysis of C3N3Cl2N (SiMe3) …

Octamethylcyclotetrasiloxane (OMCTS) is an important pre- cursor used in the chemical vapor deposition (CVD) of low-k inter-metal dielectric films (IMDs) for sub-0.25 μm IC intercon-nects. …

2018年2月1日 · Detailed chemical kinetics of OMCTS/H 2 /O 2 is critical for the prediction of flame characteristics, vapor nucleation, particle growth and deposition in the synthesis process.

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The plasma polymerization of hexamethyl disiloxane (HMDSO), divinyltetramethyl disiloxane (DVTMDSO), and octamethyl cyclotetrasiloxane (OMCATS) was investigated using either …