ALD is a vapor phase thin film deposition technique that has gained considerable popularity in recent years. The following list of ALD benefits goes a long way towards explaining the broad popularity of the technique.

Atomic layer deposition (ALD) is a thin-film deposition technique based on the sequential use of a gas-phase chemical process; it is a subclass of chemical vapour deposition. The majority of ALD reactions use two chemicals called precursors (also called "reactants").

2011年8月1日 · Plasma enhanced ALD (PE-ALD) allows deposition at significantly lower temperatures with better film properties compared to that of conventional thermal ALD. In addition, since ALD is a surface-sensitive deposition technique, surface modification through plasma exposure can be used to alter nucleation and adhesion.

等离子体增强原子层沉积 (peald) 是一种先进的薄膜沉积技术，它结合了原子层沉积 (ald) 和等离子体增强化学气相沉积 (pecvd) 的原理。 它利用原子层沉积（ALD）的连续自限制反应，实现原子级的薄膜厚度和均匀性精度，同时利用等离子体增强前驱体的反应性 ...

2014年3月5日 · Atomic layer deposition (ALD) is a key technology enabler of nanoscale memory and logic devices owing to its excellent conformality and thickness controllability. Plasma-enhanced ALD (PE-ALD) allows deposition at significantly lower temperatures with better film properties than in conventional thermal ALD.

原子层沉积（Atomic Layer Deposition，ALD）是一种先进的沉积技术，允许以精确控制的方式沉积数纳米厚度的薄膜。 ALD不仅提供了出色的厚度控制和均匀性，还能够对高长宽比结构进行全覆盖的包覆。

A plasma-enhanced atomic layer deposition (PE-ALD) system enables the conformal fabrication of thin films of various materials with atomic-scale control. ALD is a controlled chemical vapor deposition process that utilizes gas precursors to deposit a film one atomic layer at a time.

2020年5月18日 · Atomic layer deposition (ALD) is a material growth process that is based on a pair of sequential, self-limiting, surface-mediated reactions that lead to a nominal layer-by-layer growth process for a wide range of oxides, nitrides, and metals and has become a key enabling technology in semiconductor manufacturing and a rapidly expanding number of...

2019年3月18日 · In the past few years, plasma ALD has obtained a prominent position in the field of ALD with (i) a strong application base as demonstrated by the breakthrough in high-volume manufacturing; (ii) a large number of established processes, out of which several are being enabled by the plasma step; and (iii) a wide range of plasma ALD reactor designs ...

2024年12月9日 · Plasma-assisted plasma assisted atomic layer deposition (PEALD) takes this technology a step further, enhancing deposition processes with the unique properties of plasma. In this article, we explore the fundamentals of ALD, the role of plasma in improving its capabilities, key applications across industries, the benefits it provides, and the ...