PMGI and LOR resists enable high yield, metal lift-off processing in a variety of applications from data storage and wireless ICs, to MEMS. Used beneath photoresists in a bi-layer stack, PMGI …

LOR and PMGI resists are designed for applications requiring high resolution imaging, easy process tuning, high yields and superior deposition line width control. Mainstream applications …

LOR and PMGI lift-off resists are based on polydimethylglutarimide (PMGI) polymers and are well suited for a variety of critical and non-critical level lift-off processes, and as sacrificial release …

a) PMGI: SF-11 (thickness≅1.5 µm) Process Steps: • Sample Solvent Clean: acetone (2 minutes), methanol (1 minute) in ultrasonic machine. • Sample Dehydration Bake: @200 C for 1 minute. …

PMGI resists are designed to produce low defect coatings over a broad range of film thicknesses using a variety of spin coat conditions. The film thickness versus spin speed plots displayed …

LOR / PMGI series. Unique Features. No intermixing when over-coated with most top imaging resists; Single step development of bi-layer stack in TMAH or KOH developers; Quick and …

2020年10月21日 · The PMGI SF Series of resist is widely used in multilayer DUV flood exposure processes for lift-off applications, but is also suitable for single layer or multilayer e-beam and …

: PMGI SF Series Resists sp. Grav. wt.) VOC(g/L) SFI SF2 SF3 SF4 SF5 SF6 SF7 SF7.5 SF8 SFC) SFIO SFII SF12 SF13 SF14 SF15 SF17 SF19 SF23 Gi13101 102 Gli3103 Gl 13104 Gl …

2023年12月19日 · 作者提出了一种基于【梯度和强度的比例维持】（proportional maintenance of gradient and intensity，PMGI）的【端到端】的【多任务图像融合】网络。 图像融合问题可以 …

2024年8月1日 · This process is intended for Deep-UV Exposure on the ASML DUV Stepper. PMGI is used as the underlayer, which is exposed at the same time as the imaging resist. …