Evidence of Si–OH species at the surface of aged silica
1992年7月1日 · Synchrotron radiation (SR) photoemission and x‐ray photoelectron spectroscopy (XPS) are used to reveal the presence of Si–OH species at the surface of aged silica. SR Si 2 p spectra, recorded in the photon energy range 130 eV≤ h ν≤240 eV, show the coexistence of Si–O bonding states and Si–OH bonding states, the latter being marked ...
Si(-O)2 and Si(-OH)x of Si varied in different humidity storage conditions which are attributed to crystal-orientation dependent surface morphology and oxidation. The O2 RIE plasma induced high surface reactivity and humidity induced Si(-OH)x can play an important role in the hydrophilic wafer bonding with low temperature heating.
Silicic Acid – Si(OH)4 - The International XPS Database 1
Si-(OH)4 Opal: 103.7 eV: 285.0 eV: The XPS Library: Charge Referencing (N*number) identifies the number of NIST BEs that were averaged to produce the BE in the middle column. Binding Energy Scale Calibration expects Cu (2p 3/2) BE = 932.62 eV and Au (4f 7/2) BE = 83.98 eV.
On the XPS Analysis of Si–OH Groups at the Surface of Silica
1996年9月30日 · On the XPS Analysis of Si–OH Groups at the Surface of Silica. E. Paparazzo, E. Paparazzo. Istituto di Struttura della Materia del CNR Via E. Fermi 38, 00044 Frascati, Italy. Search for more papers by this author. E. Paparazzo, E. Paparazzo.
硅及多孔硅表面Si-OH、SiO2结构的理论研究 - 豆丁网
2011年2月21日 · 在以上研究的基础上，接着采用基于密度泛函理论广义梯度近似（GGA）的平面波超软赝势方法，对多孔硅表面的Si—OH结构和Si／Si02界面结构进行计算，通过分析优化后稳定的表面结构，得到以下结论：多孑L硅的表面为完全不规则摘要结构，表面Si．OH结构中的si ...
Hydrogen bonding interactions of H 2 O and SiOH on a ... - Nature
2020年1月7日 · X-ray photoelectron spectroscopy (XPS) The elemental depth profiles for Si, O, Na, B, Al, Ca, and Zr in the corroded ISG samples were determined using an XPS instrument (PHI...
Promoting Effect of Si–OH on the Decomposition of Electrolytes in ...
2020年7月14日 · X-ray photoelectron spectroscopy (XPS) characterization of solid electrolyte interphase (SEI) layers on both electrodes demonstrates the influencing mechanism that hydroxyls can react with LiPF 6 to form POF 3, which further induces the decomposition of the electrolyte solution. This study provides a new consideration that limiting the amount ...
XPS and FTIR study of silicon oxynitride thin films
1997年1月1日 · In this work, we present a study of the compositions and the chemical environments of silicon, oxygen and nitrogen in these films by using XPS, XAES and FTIR characterization methods. It is shown that the SiO x N y deposits are constituted by various silicon environments which can be described by the presence of Si(O x N y H z) tetrahedra with ...
离h2o ,缔合oh ,si —oh ,o 和o2. 根据化学态结构和元素电负性确定了化学态的各原子芯电子束缚能顺序,并与 xps窄扫描谱拟合结果相对比,建立了化学态与其束缚能的对应关系,进而用si(ch2)4 的实际c 1s 束缚能值进行 校正,确定了各化学态的束缚能.
On the XPS Analysis of Si–OH Groups at the Surface of Silica
1996年9月30日 · Fourier transform infrared analysis shows that the content of silanol groups scales with the water concentration selected for the deposition, whereas from their XPS and x-ray-induced Auger (XAES) results HWPFG infer that all the samples studied have virtually the same Si :0 surface composition, i.e. that of stoichiometric silica.
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