2021年10月15日 · Notable increase in Lc1 (54%) and Lc2 (27%) values were found for TiSiN coatings. The wear resistance of TiSiN was consistent with superior mechanical properties. The indentation response, scratch behaviour and wear performance of binary TiN and ternary TiSiN coatings under a variety of loading conditions were comparatively studied.

TiSiN coating is suitable especially for monolithic hard metal milling cutters, drills, inserts and shaping knives. It can be used in dry or near-dry machining applications for machining process.

2019年10月30日 · 本文作者采用这种离子束溅射与磁过滤阴极弧共沉积法制备 TiSiN 纳米复合薄膜，并研究沉积参数对薄膜成分、结构，以及硬度、模量、摩擦磨损等力学性能的影响。 1、实验. 1.1 薄膜制备. 以 (400)面单晶硅片 (厚度550μm)作为基底材料，依次用无水乙醇、丙酮、去离子水超声清洗20min，经高纯氮气吹干后放入真空室内。 实验采用自行设计的FDJ600高真空多功能薄膜沉积设备 (如图1所示)，本底真空为5.0×10 −4 Pa。

In this study, the effect of oxygen content on the structure and properties of (Ti 1-x Si x) (O y N 1-y) z coating is investigated. In (Ti 1-x Si x) (O y N 1-y) z coatings, oxygen substitutes nitrogen atoms in TiSiN, forming a single-phase cubic solid solution structure.

2017年10月29日 · Among a wide variety of transition metal nitride available in industries, titanium nitride (TiN) is the most common and important material as titanium- and nitrogen-based metal nitride possesses very good commercial interest because of their extreme hardness, wear resistant, corrosion resistant, thermal and electrical properties which fit well w...

2020年9月25日 · Such approach provides superior oxidation protection compared to alloying TiAlN with Si. Our results suggest that multilayers including nm thin layers of high Si-content TiSiN is a most effective approach to improve high-temperature oxidation resistance of functional ceramic thin films.

摘要 采用化学气相沉积（CVD）技术在不同N 2 流速下在p型c-Si（100）上沉积了氮化钛硅（TiSiN）薄膜。 采用扫描电子显微镜(SEM)、X射线衍射(XRD)、拉曼光谱、纳米压痕和X射线光电子能谱(XPS)对TiSiN薄膜的微观结构、声子模式、力学性能和成分进行了表征。

2017年5月18日 · The TiSiN film is well known as the nanocomposite structure with the TiN nanocrystallites encapsulated by the Si 3 N 4 interface phase, leading to the high hardness and elastic modulus...

半导体器件中的氮化硅钛(TiSiN)层以及制造该氮化硅钛层的方法,上述方法可包括:在半导体衬底上形成栅电极,并在所述栅电极的侧壁上形成间隔件;在所述半导体衬底中形成源区和漏区;以及在所述栅电极,源区,和漏区上分别形成TiSiN层.此外,半导体器件可包括栅电极 ...

相比，HiPIMS技术在制备TiSiN 纳米复合涂层上具有显著优势，有效提高了涂层的综合使役性能。 关键词：高功率脉冲磁控溅射；TiSiN 涂层；纳米复合；低应力；高硬度