USHIO will continue to develop the EUV light source technologies for high-precision mask inspection and contribute to the progress of the cutting edge semiconductor manufacturing process. EUV (Extreme ultraviolet) uses a reflective mirror instead of a lens as optics, since EUV hardly passes through a material.

2017年1月17日 · EUV (extreme ultraviolet) exposure technology at 13.5 nm wavelength is one of the most promising next-generation technologies. USHIO is conducting EUV light source development for photo mask inspection and for various other technical applications utilizing our experience in the study and development of our EUV Xe DPP and EUV Sn LDP light source ...

2019年9月10日 · USHIO will also continuously develop the EUV light source technology for high-precision mask inspection to contribute to achieving new social infrastructure such as 5G and IoT through realizing the practical use of the next-generation semiconductor manufacturing process.

2019年9月10日 · ウシオ電機株式会社（本社：東京都、代表取締役社長 内藤 宏治、以下 ウシオ）は、次世代半導体量産プロセスの進展に「光」で貢献するという方針の元、従来より研究・開発に取り組んできたEUV光源事業をさらに推し進めるため、開発から製造、運用 ...

2019年10月11日 · USHIO announces TinPhoenix, a groundbreaking EUV light source business focused on the production of next-generation semiconductor devices.

USHIO.CO.JP – USHIO INC. (Head Office: Tokyo, Chief Executive Officer: Koji Naito) will accelerate the EUV light source business, which covers the development, manufacturing, operation, and after-sales service and which USHIO has researched and developed from previously based on its policy to contribute to the development of the next ...

2019年7月23日 · USHIO will continue to develop the EUV light source technologies for high-precision mask inspection and contribute to the progress of the cutting edge semiconductor manufacturing process.

EUV =Extreme Ultra Violet light is shortest UV wavelength of 13.5nm used in lithography process. Ushio has adapted this wavelength to the light source for mask inspection. Ushio applies Laser-assisted Discharge produced Plasma(LDP) method as its EUV emission .

2022年12月1日 · Ushio has been delivering LDP sources for EUV mask actinic inspection. Our LDP source is suitable for mask inspection purposes because of its good position stability, high brightness, and sufficient cleanliness. In the field, availability of LDP sources keeps about 90% and additional improvement measures will be deployed to achieve 95%.

2017年1月17日 · For R&D of EUV Optical Systems, Masks, Pellicles, Etc. Ushio INC. (HQ: Tokyo; President and CEO: Kenji Hamashima) announced that first light* of an extreme ultra-violet (EUV) light source was achieved at a facility for the Netherlands Organization for Applied Scientific Research (hereinafter “TNO”) on December 7, 2016.